By Chris A. Mack
The cloth during this box consultant is a distillation of fabric prepare by way of Chris Mack over the last twenty years, together with notes from his graduate-level lithography direction on the college of Texas at Austin. This box consultant information the lithography technique, photo formation, imaging onto a photoresist, photoresist chemistry, and lithography regulate and optimization. An creation to next-generation lithographic applied sciences is usually integrated, in addition to an intensive lithography thesaurus and a summation of salient equations serious to somebody thinking about the lithography industry.
Contents
- image word list
- The Lithgraphy technique
- picture Formation
- Imaging right into a Photoresist
- Photoresist Chemistry
- Lithography keep an eye on and Optimization
- Equation precis
- word list
- Index
Read or Download Field Guide to Optical Lithography PDF
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Extra info for Field Guide to Optical Lithography
Sample text
Also, it is very difficult to find practical materials with refractive indices low enough to make a nearly ideal TARC. Additionally, top coatings are also used for environmental protection, keeping airborne base contaminants away from chemically amplified resists and water away from immersion resists. 38 Optical Lithography Bottom Antireflective Coatings (BARC) Reflections from the substrate can cause unwanted variations in the resist profile (standing waves) and swing curve effects. One possible solution is the bottom antireflection coating (also called bottom ARC or BARC).
If the air is replaced with a fluid of a higher refractive index, but still smaller than the index of the photoresist, the maximum possible value of the invariant will be nfluid , and the maximum possible angle of light inside the resist will be greater: sin θmax,resist = nfluid /nresist . 44. The fluid does not make the angles of light larger, but it enables those angles to be larger. If one were to design a lens to emit larger angles, immersion lithography will allow those angles to propagate into the resist.
It is the hydroxyl groups that give the PHS its high solubility, so by “blocking” these sites (by reacting the hydroxyl group with some longer chain molecule) the solubility can be reduced. A t-butoxycarbonyl group (t-BOC) can be used as the blocker, resulting in a very slowly dissolving polymer. In the presence of a strong acid and heat, the t-BOC blocked polymer will undergo acidolysis (a deblocking reaction) to generate the soluble hydroxyl group. Photoresist Chemistry 41 Absorption of Light The basic law of absorption is the empirical Lambert law: dI = −αI, which gives I(z) = I0 e−αz dz where I is the intensity of light traveling in the z-direction through a medium, and α is the absorption coefficient of the medium and has units of inverse length.